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Effect of magnetic field profile on the uniformity of a distributed electron cyclotron resonance plasma
Huang, C. C., Chou, S. F., Chang, T. H., Chao, H. W., Chen, C. C.Volume:
20
Year:
2013
Language:
english
Journal:
Physics of Plasmas
DOI:
10.1063/1.4813788
File:
PDF, 1.55 MB
english, 2013