Electroplated Ni mask for plasma etching of submicron-sized...

Microelectronic Engineering 2013 / 5 Vol. 105

Electroplated Ni mask for plasma etching of submicron-sized features in LiNbO3

Lecestre, Aurélie, Benchabane, Sarah, Robert, Laurent, Salut, Roland, Ulliac, Gwenn, Blind, Pascal
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Volume:
105
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2012.08.004
Date:
May, 2013
File:
PDF, 654 KB
english, 2013
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