![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Design of a new bottom antireflective coating composition for KrF resist
Mizutani, Kazuyoshi, Momota, Makoto, Aoai, Toshiaki, Yagihara, Morio, Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350234
File:
PDF, 792 KB
english, 1999