SPIE Proceedings [SPIE Microlithography '99 - Santa Clara,...

  • Main
  • SPIE Proceedings [SPIE Microlithography...

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Design of a new bottom antireflective coating composition for KrF resist

Mizutani, Kazuyoshi, Momota, Makoto, Aoai, Toshiaki, Yagihara, Morio, Conley, Will
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350234
File:
PDF, 792 KB
english, 1999
Conversion to is in progress
Conversion to is failed