Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields
Brenning, N, Huo, C, Lundin, D, Raadu, M A, Vitelaru, C, Stancu, G D, Minea, T, Helmersson, UVolume:
21
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/21/2/025005
Date:
April, 2012
File:
PDF, 828 KB
english, 2012