Temperature dependent Al-induced crystallization of amorphous Ge thin films on SiO2 substrates
Toko, Kaoru, Fukata, Naoki, Nakazawa, Koki, Kurosawa, Masashi, Usami, Noritaka, Miyao, Masanobu, Suemasu, TakashiVolume:
372
Language:
english
Journal:
Journal of Crystal Growth
DOI:
10.1016/j.jcrysgro.2013.03.031
Date:
June, 2013
File:
PDF, 998 KB
english, 2013