The influence of Ar addition on the structure of an a-SiOCF...

Journal of Physics D Applied Physics 2001 / 01 Vol. 34; Iss. 2

The influence of Ar addition on the structure of an a-SiOCF film prepared by plasma-enhanced chemical vapour deposition

Ding, Shi-Jin, Wang, Peng-Fei, Zhang, David Wei, Wang, Ji-Tao, Lee, Wei William
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
34
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/34/2/302
Date:
January, 2001
File:
PDF, 203 KB
english, 2001
Conversion to is in progress
Conversion to is failed