ION IMPLANTATION OF SILICON: II. ELECTRICAL EVALUATION USING HALL-EFFECT MEASUREMENTS
Mayer, J. W., Marsh, O. J., Shifrin, G. A., Baron, R.Volume:
45
Language:
english
Journal:
Canadian Journal of Physics
DOI:
10.1139/p67-340
Date:
December, 1967
File:
PDF, 701 KB
english, 1967