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Prediction of organic low- k material etching in two frequency capacitively coupled plasma
Ishihara, K, Shimada, T, Yagisawa, T, Makabe, TVolume:
48
Language:
english
Journal:
Plasma Physics and Controlled Fusion
DOI:
10.1088/0741-3335/48/12B/S10
Date:
December, 2006
File:
PDF, 222 KB
english, 2006