Cu–Ni Thin Films Electrodeposited on Si: Composition and Current Efficiency
M.L. Sartorelli, A.Q. Schervenski, R.G. Delatorre, P. Klauss, A.M. Maliska, A.A. PasaVolume:
187
Year:
2001
Language:
english
Pages:
5
DOI:
10.1002/1521-396x(200109)187:13.0.co;2-9
File:
PDF, 94 KB
english, 2001