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Electrical decoupling effect on intermediate band Ti-implanted silicon layers
Pastor, D, Olea, J, Prado, A del, García-Hemme, E, García-Hernansanz, R, Mártil, I, González-Díaz, GVolume:
46
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/46/13/135108
Date:
April, 2013
File:
PDF, 470 KB
english, 2013