[IEEE 2013 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu (2013.4.22-2013.4.24)] 2013 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Effect of fin height of tapered FinFETs on the sub-22-nm System on Chip (SoC) application using TCAD simulation

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