Characteristics of a R.F. Ion Source Used in an...

Plasma Science and Technology 2000 / 02 Vol. 2; Iss. 1

Characteristics of a R.F. Ion Source Used in an Electrostatic Accelerator

Fu-ru, Zhan, Hong-yong, Yuan, Chun-dong, Hu, Su-hua, Hu, Bin, Chen, Shu-qing, Zhang, Shao-hu, Wang, Zeng-liang, Yu, Jun, Li
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Volume:
2
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/1009-0630/2/1/012
Date:
February, 2000
File:
PDF, 299 KB
english, 2000
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