Molecular simulation of pattern formation in electron beam lithography
Yasuda, Masaaki, Sakai, Hirofumi, Takai, Rina, Kawata, Hiroaki, Hirai, YoshihikoVolume:
112
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.03.119
Date:
December, 2013
File:
PDF, 2.78 MB
english, 2013