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Equivalent oxide thickness scaling of Al 2 O 3 /Ge metal—oxide—semiconductor capacitors with ozone post oxidation
Sun, Jia-Bao, Yang, Zhou-Wei, Geng, Yang, Lu, Hong-Liang, Wu, Wang-Ran, Ye, Xiang-Dong, David, Zhang Wei, Shi, Yi, Zhao, YiVolume:
22
Language:
english
Journal:
Chinese Physics B
DOI:
10.1088/1674-1056/22/6/067701
Date:
June, 2013
File:
PDF, 402 KB
english, 2013