Superhigh-Rate Epitaxial Silicon Thick Film Deposition from...

Plasma Chemistry and Plasma Processing 2013 / 04 Vol. 33; Iss. 2

Superhigh-Rate Epitaxial Silicon Thick Film Deposition from Trichlorosilane by Mesoplasma Chemical Vapor Deposition

Sudong Wu, Makoto Kambara, Toyonobu Yoshida
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Volume:
33
Language:
english
DOI:
10.1007/s11090-013-9439-7
Date:
April, 2013
File:
PDF, 927 KB
english, 2013
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