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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Reactive ion etching of fluorine containing photoresist
Patel, Kaushal S., Pham, Victor, Li, Wenjie, Khojasteh, Mahmoud, Varanasi, Pushkara Rao, Lin, QinghuangVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.656605
File:
PDF, 256 KB
english, 2006