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AlN thin films prepared by ArF plasma assisted PLD. Role of process conditions on electronic and chemical–morphological properties
E. Cappelli, D. M. Trucchi, S. Orlando, V. Valentini, A. Mezzi…Volume:
114
Language:
english
DOI:
10.1007/s00339-013-7632-4
Date:
February, 2014
File:
PDF, 543 KB
english, 2014