Chemical control of physical properties in silicon nitride...

Applied Physics A: Materials Science & Processing 2013 / 06 Vol. 111; Iss. 3

Chemical control of physical properties in silicon nitride films

Xiangdong Xu, Dong Zhou, Qiong He, Yadong Jiang, Taijun Fan…
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Volume:
111
Language:
english
DOI:
10.1007/s00339-012-7301-z
Date:
June, 2013
File:
PDF, 755 KB
english, 2013
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