Electronic properties of silicon-nitride films deposited by...

Applied Physics A: Materials Science & Processing 1995 / 12 Vol. 61; Iss. 6

Electronic properties of silicon-nitride films deposited by low-energy ion-beam bombardment

Zhong-Min Ren, Fang Lu, Yuan-Cheng Du, Zhi-Feng Ying, Fu-Ming Li
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
61
Language:
english
DOI:
10.1007/BF01542876
Date:
December, 1995
File:
PDF, 188 KB
english, 1995
Conversion to is in progress
Conversion to is failed