Formation kinetics of CrSi2 films on Si substrates with and...

Journal of Applied Physics 1976 Vol. 47; Iss. 12

Formation kinetics of CrSi2 films on Si substrates with and without interposed Pd2Si layer

Olowolafe, J. O.
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Volume:
47
Year:
1976
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.322591
File:
PDF, 588 KB
english, 1976
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