[IEEE 2008 Symposium on VLSI Technology - Honolulu, HI, USA (2008.06.17-2008.06.19)] 2008 Symposium on VLSI Technology - A cost effective 32nm high-K/ metal gate CMOS technology for low power applications with single-metal/gate-first process
Chen, X., Samavedam, S., Narayanan, V., Stein, K., Hobbs, C., Baiocco, C., Li, W., Jaeger, D., Zaleski, M., Yang, H. S., Kim, N., Lee, Y., Zhang, D., Kang, L., Chen, J., Zhuang, H., Sheikh, A., WallneYear:
2008
Language:
english
DOI:
10.1109/VLSIT.2008.4588573
File:
PDF, 519 KB
english, 2008