SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Optimum tone for various feature types: positive versus negative
Brunner, Timothy A., Fonseca, Carlos A., Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436866
File:
PDF, 119 KB
english, 2001