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Temperature dependence of oxidation induced stacking faults and oxygen incorporation in dislocation-free Czochralski silicon
M.S. Bawa, W.J. Bell, H.M. Grimes, T.J. ShaffnerVolume:
94
Year:
1989
Language:
english
Pages:
4
DOI:
10.1016/0022-0248(89)90107-3
File:
PDF, 363 KB
english, 1989