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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XX - Yokohama, Japan (Tuesday 16 April 2013)] Photomask and Next-Generation Lithography Mask Technology XX - Megasonic cleaning: effect of dissolved gas properties on cleaning
Shende, Hrishi, Singh, Sherjang, Baugh, James, Dietze, Uwe, Dress, Peter, Kato, KokoroVolume:
8701
Year:
2013
Language:
english
DOI:
10.1117/12.2029883
File:
PDF, 1.02 MB
english, 2013