Optimization of InP / Si heteroepitaxial growth conditions using organometallic vapor phase epitaxy
Akio Yamamoto, Naoto Uchida, Masafumi YamaguchiVolume:
96
Year:
1989
Language:
english
Pages:
9
DOI:
10.1016/0022-0248(89)90535-6
File:
PDF, 1.15 MB
english, 1989