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SPIE Proceedings [SPIE SPIE Europe Optical Metrology - Munich, Germany (Monday 15 June 2009)] Modeling Aspects in Optical Metrology II - Lithography simulation: modeling techniques and selected applications
Erdmann, Andreas, Fühner, Tim, Shao, Feng, Evanschitzky, Peter, Bosse, Harald, Bodermann, Bernd, Silver, Richard M.Volume:
7390
Year:
2009
Language:
english
DOI:
10.1117/12.829409
File:
PDF, 2.96 MB
english, 2009