Control of composition and deposition rate in Si-Ge CVD...

Control of composition and deposition rate in Si-Ge CVD epitaxy on Si

Manabu Kato, Junichi Murota, Shoichi Ono
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
115
Year:
1991
Language:
english
Pages:
5
DOI:
10.1016/0022-0248(91)90723-i
File:
PDF, 356 KB
english, 1991
Conversion to is in progress
Conversion to is failed