Control of composition and deposition rate in Si-Ge CVD epitaxy on Si
Manabu Kato, Junichi Murota, Shoichi OnoVolume:
115
Year:
1991
Language:
english
Pages:
5
DOI:
10.1016/0022-0248(91)90723-i
File:
PDF, 356 KB
english, 1991