![](/img/cover-not-exists.png)
Formation of TiN by nitridation of magnetron sputtered Ti films using microwave plasma CVD
Jong Moon, Toshimichi Ito, Jing Sheng Ma, Akio HirakiVolume:
115
Year:
1991
Language:
english
Pages:
7
DOI:
10.1016/0022-0248(91)90809-j
File:
PDF, 402 KB
english, 1991