Low pressure MOCVD in a vertical reactor: growth and...

Low pressure MOCVD in a vertical reactor: growth and characterization of InGaAsP on (100)InP for 1.3 μm lasers

V.R. McCrary, D.L. Van Haren, J.L. Zilko, J. Blaha, S.E.G. Slusky, J.W. Lee, S.N.G. Chu, P. Thomas, V. Swaminathan
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Volume:
112
Year:
1991
Language:
english
Pages:
8
DOI:
10.1016/0022-0248(91)90910-w
File:
PDF, 648 KB
english, 1991
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