Thermal stability of Si/Si1 − x − yGexCy/Si...

Journal of Crystal Growth 1995 Vol. 157; Iss. 1-4

Thermal stability of Si/Si1 − x − yGexCy/Si heterostructures grown by rapid thermal chemical vapor deposition

Patricia Warren, Jian Mi, Frédéric Overney, Michel Dutoit
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
157
Year:
1995
Language:
english
Pages:
6
DOI:
10.1016/0022-0248(95)00334-7
File:
PDF, 424 KB
english, 1995
Conversion to is in progress
Conversion to is failed