![](/img/cover-not-exists.png)
In situ real-time temperature and thickness measurement for SiSiGe growth on MBE and RTCVD systems
H. Möller, F.G. Böbel, B. Hertel, T. Lindenberg, G. RitterVolume:
157
Year:
1995
Language:
english
Pages:
6
DOI:
10.1016/0022-0248(95)00352-5
File:
PDF, 309 KB
english, 1995