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Nickel silicide formation and dissociative adsorption of carbon monoxide on nickel/silicon (111) studied by UPS and XPS
Asakawa, Tetsuo, Tanaka, Katsumi, Toyoshima, IsamuVolume:
95
Language:
english
Journal:
The Journal of Physical Chemistry
DOI:
10.1021/j100165a035
Date:
June, 1991
File:
PDF, 640 KB
english, 1991