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Atomic layer deposition of Al2O3 films using AlCl3 and Al(OiPr)3 as precursors
Räisänen, Petri I., Ritala, Mikko, Leskelä, MarkkuVolume:
12
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/B201385C
Date:
April, 2002
File:
PDF, 190 KB
english, 2002