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Dendrimers with Thermally Labile End Groups: An Alternative Approach to Chemically Amplified Resist Materials Designed for Sub-100 nm Lithography
D. C. Tully, A. R. Trimble, J. M. J. FréchetVolume:
12
Year:
2000
Language:
english
Pages:
5
DOI:
10.1002/1521-4095(200008)12:153.0.co;2-i
File:
PDF, 264 KB
english, 2000