[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Activation and deactivation studies of laser thermal annealed boron, arsenic, phosphorus, and antimony ultra-shallow abrupt junctions
Murto, R., Jones, K., Rendon, M., Talwar, S.Year:
2000
Language:
english
DOI:
10.1109/.2000.924113
File:
PDF, 366 KB
english, 2000