A New Approach to Plasma CVD of TiO 2...

Plasma Science and Technology 2004 / 12 Vol. 6; Iss. 6

A New Approach to Plasma CVD of TiO 2 Photocatalyst on γ-Al 2 O 3 Pellet Filled in Dielectric Barrier Discharges at Atmospheric Pressure

Aimin, Zhu, Longhui, Nie, Xiuling, Zhang, Chuan, Shi, Zhimin, Song, Yong, Xu
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Volume:
6
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/1009-0630/6/6/006
Date:
December, 2004
File:
PDF, 409 KB
english, 2004
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