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SPIE Proceedings [SPIE Micromachining and Microfabrication '96 - Austin, TX (Monday 14 October 1996)] Micromachining and Microfabrication Process Technology II - High-etch-rate anisotropic deep silicon plasma etching for the fabrication of microsensors
Pandhumsoporn, Tam, Feldbaum, Michael, Gadgil, Prashant, Puech, Michel, Maquin, Philippe, Pang, Stella W., Chang, Shih-ChiaVolume:
2879
Year:
1996
Language:
english
DOI:
10.1117/12.251235
File:
PDF, 486 KB
english, 1996