Control of the interfacial reaction in HfO2 on...

Applied Surface Science 2013 / 10 Vol. 283

Control of the interfacial reaction in HfO2 on Si-passivated GaAs

Park, Sang Han, Kang, Yu Seon, Chae, Jimin, Kim, Hyo Jin, Cho, Mann-Ho, Ko, Dae-Hong, Byun, Young-Chul, Kim, Hyoungsub, Cho, Sang Wan, Kim, Chung Yi, Seo, Jung-Hye
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
283
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2013.06.118
Date:
October, 2013
File:
PDF, 1.90 MB
english, 2013
Conversion to is in progress
Conversion to is failed