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Comparative study of trap-limited hydrogen diffusion in amorphous SiC, Si 0.66 C 0.33 N 1.33 , and SiN 1.33 films
Schmidt, H, Borchardt, G, Geckle, U, Bruns, M, Baumann, HVolume:
18
Language:
english
Journal:
Journal of Physics: Condensed Matter
DOI:
10.1088/0953-8984/18/23/009
Date:
June, 2006
File:
PDF, 192 KB
english, 2006