Tin laser-produced plasma source modeling at 13.5ânm for extreme ultraviolet lithography
White, J., OâSullivan, G., Zakharov, S., Choi, P., Zakharov, V., Nishimura, H., Fujioka, S., Nishihara, K.Volume:
92
Year:
2008
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.2906901
File:
PDF, 624 KB
english, 2008