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A high voltage pulse power supply for metal plasma immersion ion implantation and deposition
Salvadori, M. C., Teixeira, F. S., ArauÌjo, W. W. R., Sgubin, L. G., Sochugov, N. S., Spirin, R. E., Brown, I. G.Volume:
81
Year:
2010
Language:
english
Journal:
Review of Scientific Instruments
DOI:
10.1063/1.3518969
File:
PDF, 691 KB
english, 2010