Bubble Point Pressure of the Solutions of H 2 SiF 6 + H 2 O and H 2 SiF 6 + CO(NH 2 ) 2 + H 2 O from 323 K to 353 K
Hou, Cui-Hong, Wang, Guang-Long, Zhang, Bao-LinVolume:
51
Language:
english
Journal:
Journal of Chemical & Engineering Data
DOI:
10.1021/je050245x
Date:
May, 2006
File:
PDF, 124 KB
english, 2006