Fabrication of 30-nm-Pitched CoPt Magnetic Dot Arrays Using...

Fabrication of 30-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Lithography and Ion Milling for Patterned Media

Mohamad, Zulfakri, Alip, Rosalena Irma, Komori, Takuya, Akahane, Takashi, Zhang, Hui, Huda, Miftakhul, Yin, You, Hosaka, Sumio
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Volume:
534
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.534.118
Date:
January, 2013
File:
PDF, 392 KB
english, 2013
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