Role of xenon additive in microwave plasma-assisted (H[sub 2]+CH[sub 4]) chemical vapor deposition of diamond thin film
Hosomi, Takeshi, Maki, Tetsuro, Kobayashi, Takeshi, Yoshizako, Yuji, Taniguchi, Michio, Sugiyo, MasatoVolume:
84
Year:
1998
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.368916
File:
PDF, 525 KB
english, 1998