SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Directed self-assembly process implementation in a 300mm pilot line environment
Liu, Chi-Chun, Tong, William M., Resnick, Douglas J., Estrada-Raygoza, I. Cristina, Abdallah, Jassem, Holmes, Steven, Yin, Yunpeng, Schepis, Anthony, Cicoria, Michael, Hetzer, David, Tsai, Hsinyu, GuiVolume:
8680
Year:
2013
Language:
english
DOI:
10.1117/12.2011610
File:
PDF, 1.19 MB
english, 2013