SPIE Proceedings [SPIE Photomask and NGL Mask Technology XX...

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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XX - Yokohama, Japan (Tuesday 16 April 2013)] Photomask and Next-Generation Lithography Mask Technology XX - A study of applications scribe frame data verifications using design rule check

Saito, Shoko, Miyazaki, Masaru, Sakurai, Mitsuo, Itoh, Takahisa, Doi, Kazumasa, Sakurai, Norioko, Okada, Tomoyuki, Kato, Kokoro
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Volume:
8701
Year:
2013
Language:
english
DOI:
10.1117/12.2028330
File:
PDF, 511 KB
english, 2013
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