Investigation of reactive HiPIMS+MF sputtering of TiO2...

Surface and Coatings Technology 2013 / 10 Vol. 232

Investigation of reactive HiPIMS+MF sputtering of TiO2 crystalline thin films

Olejníček, J., Hubička, Z., Kment, Š., Čada, M., Kšírová, P., Adámek, P., Gregora, I.
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Volume:
232
Language:
english
Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2013.05.038
Date:
October, 2013
File:
PDF, 1.38 MB
english, 2013
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