SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Overlay accuracy in 0.18-μm copper dual-damascene process
Schulz, Bernd, Levinson, Harry J., Seltmann, Rolf, Seligson, Joel L., Izikson, Pavel, Ronen, Anat, Herr, Daniel J. C.Volume:
4689
Year:
2002
Language:
english
DOI:
10.1117/12.473477
File:
PDF, 127 KB
english, 2002