SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - 65nm mask CD qualification on critical features through simulation based lithography verification
van Adrichem, Paul J. M., Valadez, John, Ziger, David, Gerold, Dave, Komuro, MasanoriVolume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617519
File:
PDF, 143 KB
english, 2005