Incorporation mechanism of N, Al, and B impurities in chemical vapor deposition of SiC
Kimoto, Tsunenobu, Itoh, Akira, Matsunami, HiroyukiVolume:
67
Year:
1995
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.114555
File:
PDF, 365 KB
english, 1995